Dress to IMPRESS Save the Date and Call for Art!
The Morgan's 3rd Annual Dress to IMPRESS Paper Fashion Fundraiser is Saturday, October 3rd from 6-10 p.m.
This year’s theme is BRAVE NEW WORLD(S) ~ a hyper-stylish and fashion-forward era. The world of fashion has consistently served as a mirror to society, reflecting current moods, societal movements, and cultural paradigms. Get excited for a gorgeous night of wild paper fashion featuring a juried red carpet runway show, art exhibition, silent & online auctions, finger food, DJ, post-event dance party, and more! Tickets will go on sale August 15th.
In conjunction with Dress to IMPRESS, the Morgan Conservatory is seeking artwork that explores dystopian themes and possible futures through paper- and print-focused media. Artworks should be primarily two-dimensional / for wall display. Artists may submit up to three entries. The exhibition will be on view from September 23rd to October 24th, 2026.
Submissions Deadline: Saturday, August 22nd at 11:59 p.m. EST
Notification of Acceptance: Saturday, August 29th
Genius Loci, the Pathos of Places
Curated by Arron Levi Foster & Erik Waterkotte
On View through August 28
Originally exhibited at the 2024 Mid-American Print Council’s Biannual Print Conference, and reprised for exhibition at the Morgan Conservatory, Genius Loci, the Pathos of Places features 15 contemporary artists whose works explore the interstitial impact of particular places using print, hand papermaking, photography, installation, and mixed media. Curated by Arron Foster and Erik Waterkotte, the artists’ projects each document, express, and expose unique geographic places. Genius Loci, “the spirit of the place”, refers to a location’s distinctive atmosphere or a location’s protective spirit and how humans assign meaning and respond emotionally to places; both individually and in our collective existence.
Read the wonderful write up by Carlo Wolff in Canvas magazine here.
Much fun celebrating the Morgan's Graduating Professional Papermakers & Cookout on Saturday, July 25th!
Nicole Donnelly moderated a fascinating Q&A with our first cohort of graduating professional papermakers: Julianne Hunter (Ithaca, NY), Moss Nash (Athens, OH), Mia Pons (Oklahoma City, OK), and Omolará Williams McCallister (Miami) as they shared stories about their work, upcoming projects and learning experiences as well as collaborative edition with visual and performance artist Kelly Taylor Mitchell. A fun cookout followed the touching graduation ceremony.
In The Store
The "Printer’s Choice Line", formerly the Artist Curated Paper Line, has been selected based on feedback from various artists who have experimented and worked with the fine art paper produced by hand at the Morgan Papermaking Conservatory. This line of paper is ideal for editioned works.
Chosen for their versatility and unique characteristics, these crisp sheets offer an unmatched quality and structure that allows each to withstand more stress to the surface than traditional machine-made papers. Explore this special line of paper to see and feel the difference for yourself.
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